Development of mass-production-type plasma chemical vapour deposition equipment and its application to various dies
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference6 articles.
1. The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−x
2. Plasma chemical vapor deposition of TiN
3. Influence of temperature on the growth of TiN films by plasma-assisted chemical vapour deposition
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