The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−x
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Proc. 3rd Int. Conf. on Chemical Vapor Deposition;Ruppert,1972
2. 9th Plansee Semin.;Bunshah,1977
3. Proc. 5th Int. Conf. on Chemical Vapor Deposition;Sugiyama,1975
4. Proc. Int. Conf. on Advances in Surface Coating Technology;Hazlewood,1978
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