Author:
Kirchhoff V.,Kopte T.,Winkler T.,Schulze M.,Wiedemuth P.
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference7 articles.
1. Pulsed magnetron sputter technology
2. Potenzen des Puls-Magnetron-Sputterns (PMS)
3. Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering
4. Proceedings of the Third International Symposium on Sputtering and Plasma Processes, ISSP '95;Bräuer,1995
5. Proceedings of the Third International Symposium on Sputtering and Plasma Processes, ISSP '95;Beißwenger,1995
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