Power supply efficiency in dual magnetron large area sputter coatings

Abstract

Abstract In large area sputter coating of glass, the consumption of electric power is one of the major cost drivers. This applies especially to dielectric transparent coatings which are relatively thick and for which sputter yields and rates can be rather low. These materials are usually sputtered from dual magnetrons using medium frequency (sine wave) or bipolar (square wave) power supplies at frequencies up to 100 kHz. Frequencies at 50 kHz or higher are beneficial for suppressing arcing on the target surface, and the power required to achieve viable sputter rates is often high, making the power consumption a significant cost contribution. In this study we look at the effect of the power supply technology and frequency on the sputter rate and the sputtered layer thickness per electrical energy input. The tests were carried out with aluminum dual planar targets and with TiOx dual rotary targets. At low frequencies around 20 kHz, the bipolar generator can yield about 10% higher sputtering rates at the same input power. At about 40 kHz, which is often chosen to minimize arcing, the rates from the two power supplies are about equal.