Reactive magnetron sputtering deposition of TiN films. II. Influence of substrate temperature on the mechanical properties of the films-Reference-Cited by-同舟云学术

Reactive magnetron sputtering deposition of TiN films. II. Influence of substrate temperature on the mechanical properties of the films

Published:1997-01 Issue:1-3 Volume:88 Page:28-37
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Combadiere Laurette,Machet Jean

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference17 articles.

1. L. Combadiere and J. Machet, Reactive magnetron sputtering deposition of TiN films. I: Influence of the substrate temperature on structure, composition and morphology of the films.

2. The scratch adhesion test: An elastic-plastic indentation analysis

3. Scratch adhesion testing of hard coatings

4. Ti–N phases formed by reactive ion plating

5. Proc. Int. Ion Engineering Cong.;Matthews,1983

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