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The energy dependence on microstructure of (Ti–Al–V) nitrides deposited by dual ion beam sputtering

  • Published:1999-09 Issue: Volume:116-119 Page:969-972
  • ISSN:0257-8972
  • Container-title:Surface and Coatings Technology
  • language:en
  • Short-container-title:Surface and Coatings Technology

Author:

Hübler R.,Tentardini E.K.,Blando E.,Teixeira S.R.,Vasconcellos M.Z.,Soares M.,Kamijo E.,Fujiwara M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanostructured vanadium carbide thin films produced by RF magnetron sputtering;Scanning;2015-03-30

2. Laser Gas Assisted Nitriding and TiN Coating of Ti-6Al-4V Alloy;Advanced Materials Research;2011-06

3. Laser gas‐assisted nitriding of steel: residual stress analysis;Industrial Lubrication and Tribology;2010-06-22

4. Laser nitriding of tool steel: thermal stress analysis;The International Journal of Advanced Manufacturing Technology;2009-12-18

5. Study of Aluminum Film Deposition on the Surface of Micro-Trench by Dual Ion Beam Sputtering;Japanese Journal of Applied Physics;2008-06-20
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