Ion bombardment effects during deposition of nitride and metal films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference29 articles.
1. Use of ion beam assisted deposition to modify the microstructure and properties of thin films
2. Modification of mechanical and chemical properties of thin films by ion bombardment
3. Ion beam assisted thin film deposition
4. The influence of ion irradiation during film growth on the chemical stability of film/substrate systems
5. Microstructure of sputtered metal films grown in high‐ and low‐pressure discharges
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