Magnetron deposition of copper oxide coatings in a metallic mode enhanced by RF-ICP source: A role of substrate biasing
Author:
Funder
Ministry of Education and Science of the Russian Federation
Russian Science Foundation
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference25 articles.
1. Nanostructured iron oxide thin films deposited by RF sputtering as catalysts for the heterogeneous solar photo-Fenton reaction;Bosso;Vacuum,2023
2. Effect of surface treatment of sputtered nickel oxide in inverted perovskite solar cells;Pandian;Thin Solid Films,2022
3. Structural and electrical properties of high-performance vanadium dioxide thin layers obtained by reactive magnetron sputtering;Sirjita;Thin Solid Films,2022
4. Sputter yield measurements to evaluate the target state during reactive magnetron sputtering;Schelfhout;Surf. Coat. Technol.,2020
5. High-rate magnetron deposition of CuOx films in the metallic mode enhanced by radiofrequency inductively coupled plasma source;Sidelev;Vacuum,2023
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1. Influence of Treatment Time on the Synthesis of Copper Oxide Semiconductor Films by Cathode Cage Plasma Deposition;Journal of Electronic Materials;2024-09-14
2. Exploring the mechanisms and characteristics of enhanced anti-corrosion and abrasion resistance of Ni–W coatings reinforced with Mg–Al LDH;Vacuum;2024-04
3. Magnetron Deposition of Oxide Films in the Metallic Mode Enhanced by Radio-Frequency Inductively Coupled Plasma Source;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2023-10
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