Sputter yield measurements to evaluate the target state during reactive magnetron sputtering
Author:
Funder
FWO
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
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5. On the effective sputter yield during magnetron sputter deposition;Depla;Nucl. Instrum. Methods Phys. Res., Sect. B,2014
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