An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering
Author:
Funder
FWO-Flanders
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference55 articles.
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4. High rate reactive dc magnetron sputter deposition of Al2O3 films;Kharrazi Olsson;J. Vac. Sci. Technol. A,1998
5. Advances in partial-pressure control applied to reactive sputtering;Sproul;Surf. Coat. Technol.,1989
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