Study of Aluminum Film Deposition on the Surface of Micro-Trench by Dual Ion Beam Sputtering
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference9 articles.
1. The energy dependence on microstructure of (Ti–Al–V) nitrides deposited by dual ion beam sputtering
2. Optimization of nitrogenated amorphous carbon films deposited by dual ion beam sputtering
3. Bonding and morphology study of carbon nitride films obtained by dual ion beam sputtering
4. Effect of argon ion beam voltages on the microstructure of aluminum nitride films prepared at room temperature by a dual ion beam sputtering system
5. The influence of secondary ion beam irradiation on the formation of Si nanocrystals during dual ion beam sputtering
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