Relationship between interface property and energy band alignment of thermally grown SiO2 on 4H-SiC(0001)-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Relationship between interface property and energy band alignment of thermally grown SiO2 on 4H-SiC(0001)

Published:2012-12 Issue: Volume:12 Page:S79-S82
ISSN:1567-1739
Container-title:Current Applied Physics
language:en
Short-container-title:Current Applied Physics

Author:

Hosoi Takuji,Kirino Takashi,Mitani Shuhei,Nakano Yuki,Nakamura Takashi,Shimura Takayoshi,Watanabe Heiji

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Materials Science

Reference20 articles.

1. Elimination of SiC/SiO2 interface states by preoxidation ultraviolet‐ozone cleaning

2. Intrinsic SiC/SiO2 Interface States

3. Effects of Ar and H2 annealing on the electrical properties of oxides on 6H SiC

4. Interfacial characteristics of N2O and NO nitrided SiO2 grown on SiC by rapid thermal processing

5. Reduction of interface-state density in 4H–SiC n-type metal–oxide–semiconductor structures using high-temperature hydrogen annealing

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Microwave synthesis and photocatalytic H2 production performance of SiO2 aerogel/ZnCdS solid solution catalyst;Inorganic Chemistry Communications;2024-10

2. The extraction of gate oxide thickness on silicon carbide wide-bandgap material using thermal oxidation based regression techniques for high-power applications;AIP Conference Proceedings;2024

3. The effects of stress on interfacial properties and flatband voltage instability of 4H-SiC MOS structures;Microelectronics Reliability;2023-08

4. Gate-oxide interface performance improvement technology of 4H-SiC MOSFET;Chinese Science Bulletin;2023-02-07

5. Characterization of deep traps in the near-interface oxide of widegap metal–oxide–semiconductor interfaces revealed by light irradiation and temperature change;Japanese Journal of Applied Physics;2022-04-28

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3