Author:
Fitsilis F.,Regnery S.,Ehrhart P.,Waser R.,Schienle F.,Schumacher M.,Dauelsberg M.,Strzyzewski P.,Juergensen H.
Subject
Materials Chemistry,Ceramics and Composites
Reference7 articles.
1. High-permittivity perovskite thin films for dynamic random-access memories;Kingon;MRS Bulletin,1996
2. Wessels, B. W., MOCVD of ferroelectric oxide thin films for electronic and optical applications. Annu. Rev. Mater. Sci., 25; 1995, 525–546 and references therein.
3. Deposition characteristics of (Ba,Sr)TiO3 thin films by liquid delivery MOCVD at low temperatures;Kang;Jpn. J. Appl. Phys.,1997
4. Microstructure control of (Ba,Sr)–TiO3 films for Gigabit DRAM;Shen;MRS Symp. Proceed.,1998
5. CVD technology of (Ba,Sr)TiO3 thin films for Gbit-scale DRAMs;Horikawa;MRS Symp. Proceed.,1999
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