A technique for producing polysilicon patterns with bevelled edge profiles using wet etching
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference6 articles.
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Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Description of non-equilibrium phenomena in pulsed MOS capacitors;Applied Physics A Solids and Surfaces;1992-05
2. Taper Etching of an Amorphous Soft Magnetic CoNbZr Alloy Using an Interfacial Organosilane Layer;Journal of The Electrochemical Society;1989-06-01
3. Direct correlation of generation lifetimes obtained from pulsed MOS capacitance and gated diode measurements;Solid-State Electronics;1983-02
4. A quick method for the determination of bulk generation lifetime in semiconductors from pulsed MOS capacitance measurements;Solid-State Electronics;1981-07
5. Tapered Windows in SiO2, Si3 N 4, and Polysilicon Layers by Ion Implantation;Journal of The Electrochemical Society;1981-03-01
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