Examination of the solubility and the molecular weight distribution of PMMA in view of an optimised resist system in deep etch x-ray lithography-Reference-Cited by-同舟云学术

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Examination of the solubility and the molecular weight distribution of PMMA in view of an optimised resist system in deep etch x-ray lithography

Published:1993-04 Issue:1-4 Volume:21 Page:271-274
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

El-Kholi A.,Bley P.,Göttert J.,Mohr J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference2 articles.

1. Description of microstructures in LIGA-technology

2. Resist technology for deep-etch synchrotron radiation lithography

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1. Deep X-ray Lithography;Micromanufacturing Engineering and Technology;2015

2. Novel fabrication process for a monolithic PMMA torsion mirror and vertical comb actuator;Journal of Micromechanics and Microengineering;2011-05-18

3. Deep X-Ray Lithography;Micro-Manufacturing Engineering and Technology;2010

4. Exposure and Development Simulation for Deep X‐Ray LIGA;LIGA and Its Applications;2008-11-26

5. LIGA;Comprehensive Microsystems;2008

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