Built in mask (BIM) : A new way to a submicron process with high resolution and good latitude-Reference-Cited by-同舟云学术

Built in mask (BIM) : A new way to a submicron process with high resolution and good latitude

Published:1987-12 Issue:1-4 Volume:6 Page:495-501
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Vollenbroek F.A.,Nijssen W.P.M.,Geomini M.J.H.J.,Mutsaers C.M.J.,Visser R.J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. F.A. Vollenbroek and E.J. Spiertz, Adv. Polym. Sci. in the press.

2. Profile modification of resist patterns in optical lithography

3. A Quantitative Assessment Of Image Reversal, A Candidate For A Submicron Process With Improved Linewidth Control

4. The Mechanism Of The Desire Process

5. Optical lithography simulation: Introduction to SPESA

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. New Simulation for Wet and Dry Developable Photoresists;Japanese Journal of Applied Physics;1990-11-20

2. IMRE, BIM and SUPER using patternwise esterification;Microelectronic Engineering;1990-04

3. Image reversal of diazo-novolak resist by concurrent bake promoted and photoacid catalyzed esterifications;Microelectronic Engineering;1990-04

4. The chemistry of g-line photoresist processes;Polymer Engineering and Science;1989-08

5. Photochemical Surface Reactions of Polymeric Systems: Lithographic Applications;Photochemistry on Solid Surfaces;1989