The Mechanism Of The Desire Process

Author:

Roland B.1,Lombaerts R.1,Jakus C.1,Coopmans F.2

Affiliation:

1. UCB N.V. (Belgium)

2. IMEC vzw. (Belgium)

Publisher

SPIE

Cited by 30 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. POLYMER MATERIALS FOR MICROELECTRONICS IMAGING APPLICATIONS;Applied Polymer Science: 21st Century;2000

2. Microlithographic Applications of Organosilicon Polymers;Silicon-Containing Polymers;2000

3. Application of dichromated gelatin for dry developed lithographic techniques on GaAs;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999

4. Thin-film imaging: Past, present, prognosis;IBM Journal of Research and Development;1997-01

5. New Silylation Bi-layer Resist System Employing Photochemical Selective Resist Silylation;Japanese Journal of Applied Physics;1994-06-15

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