New Simulation for Wet and Dry Developable Photoresists
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Published:1990-11-20
Issue:Part 1, No. 11
Volume:29
Page:2625-2631
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Tol A. J. W.,Reuhman M. E.,Maxwell G. D.,Urbach H. P.,Visser R. J.
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering