Author:
Mutsaers C.M.J.,Vollenbroek F.A.,Nijssen W.P.M.,Visser R.J.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference11 articles.
1. Reuhman-Huisken M.E., Microcircuit Engineering '89, to be published in Microelectronic Engineering.
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3. Image Reversal Resist for g-line Exposure: Chemistry and Lithographic Evaluation
4. Vollenbroek F.A., Mutsaers C.M.J., Nijssen W.P.M., Symposium on Photoacid Generating Compounds
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12 articles.
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