Novel Top-Surface Imaging Process by Selective Chemisorption of Poly(dimethyl siloxane) on Diazoketo-Functionalized Single Component Photoresist
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Organic Chemistry
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1. Interface imaging process for high resolution and high aspect ratio patterning;European Polymer Journal;2013-06
2. Novel One-Component Positive-Tone Chemically Amplified I-Line Molecular Glass Photoresists;ACS Applied Materials & Interfaces;2012-05-09
3. Nonchemically amplified resists possessing cholate moiety for micropatterning of biomolecules;Microelectronic Engineering;2011-01
4. Photoactive Diazoketo-Functionalized Self-Assembled Monolayer for Biomolecular Patterning;Langmuir;2009-07-13
5. A new type of eco-friendly resist based on nonchemically amplified system;Journal of Polymer Science Part A: Polymer Chemistry;2008-10-13
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