Image Reversal Resist for g-line Exposure: Chemistry and Lithographic Evaluation-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Image Reversal Resist for g-line Exposure: Chemistry and Lithographic Evaluation

Published:1989-08-22 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Technology and Processing VI
language:
Short-container-title:

Author:

Buhr Gerhard¹,Lenz Helmut¹,Scheler Siegfried¹

Affiliation:

1. R & D Informationstechnik-Division (United States)

Publisher

SPIE

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photolithography;Materials Science and Technology;2013-02-15

2. Exploration of thermolithography for micro- and nanomanufacturing;Applied Physics Letters;2006-03-20

3. Generation of subquarter-micron resist structures using optical interference lithography and image reversal;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11

4. Wet silylation and oxygen plasma development of photoresists: A mature and versatile lithographic process for microelectronics and microfabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-09

5. MR head wafer fabrication technology: current and future perspectives;IEEE Transactions on Magnetics;1996

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP