Author:
Oertel H.K.,Weiβ M.,Huber H.-L.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
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Cited by
8 articles.
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1. Effects of Mask Line-and-Space Ratio in Replicating near-0.1-µmPatterns in X-Ray Lithography;Japanese Journal of Applied Physics;1995-12-30
2. Lithography for micro-electronics;Radiation Physics and Chemistry;1995-03
3. Applications of faceted mirrors to X-ray lithography beamlines;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1994-08
4. Analysis of Sub-0.15 µm Pattern Replicationin Synchrotron Radiation Lithography;Japanese Journal of Applied Physics;1993-12-30
5. Modeling X-ray proximity lithography;IBM Journal of Research and Development;1993-05