Modeling X-ray proximity lithography-Reference-Cited by-同舟云学术

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Modeling X-ray proximity lithography

Published:1993-05 Issue:3 Volume:37 Page:331-350
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Guo Jerry Z. Y.,Cerrina F.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5389637/05389642.pdf?arnumber=5389642

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dense plasma focus: different cathode geometries and their influence on the hard x-ray production;Plasma Physics and Controlled Fusion;2023-02-22

2. Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-03

3. Fast and accurate X-ray lithography simulation enabled by using Monte Carlo method. New version of DoseSim: a software dedicated to deep X-ray lithography (LIGA);Microsystem Technologies;2012-08-10

4. X-ray nanofocusing by kinoform lenses: A comparative study using different modeling approaches;Physical Review B;2010-02-01

5. SYNCHROTRON-RADIATION-SUPPORTED HIGH-ASPECT-RATIO NANOFABRICATION;COSMOS;2007-11

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