Comparison of projection and proximity printings--from UV to x ray
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9 articles.
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1. Photomask Etching;Handbook of Advanced Plasma Processing Techniques;2000
2. High-numerical-aperture optical designs;IBM Journal of Research and Development;1997-01
3. X-ray nanolithography: Extension to the limits of the lithographic process;Microelectronic Engineering;1996-09
4. The Exposure-Defocus Forest;Japanese Journal of Applied Physics;1994-12-30
5. Analysis of Sub-0.15 µm Pattern Replicationin Synchrotron Radiation Lithography;Japanese Journal of Applied Physics;1993-12-30