Applications of faceted mirrors to X-ray lithography beamlines
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference18 articles.
1. these Proceedings 8th Nat. Conf. on Synchrotron Instrumentation;Xiao,1994
2. Verification of partially coherent light diffraction models in x-ray lithography
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. 40 Years of SHADOW: Serving Four Generations of Synchrotron Facilities;Synchrotron Radiation News;2023-09-03
2. SHADOW3: a new version of the synchrotron X-ray optics modelling package;Journal of Synchrotron Radiation;2011-07-20
3. High-power free-electron lasers: Theory and applications;Journal of Russian Laser Research;1997-03
4. Design of an aspheric mirror for synchrotron radiation X-ray lithography beamline;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1994-08
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