Optimizing disk registration algorithms for nanobeam electron diffraction strain mapping-Reference-Cited by-同舟云学术

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Optimizing disk registration algorithms for nanobeam electron diffraction strain mapping

Published:2017-05 Issue: Volume:176 Page:170-176
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Pekin Thomas C.,Gammer Christoph,Ciston Jim,Minor Andrew M.,Ophus Colin

Funder

Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering Division, of the U.S. Department of Energy

Austrian Science Fund (FWF)

Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Fundamentals of silicon material properties for successful exploitation of strain engineering in modern CMOS manufacturing;Chidambaram;IEEE Trans. Electron Devices,2006

2. Strain measurement at the nanoscale: comparison between convergent beam electron diffraction, nano-beam electron diffraction, high resolution imaging and dark field electron holography;Béché;Ultramicroscopy,2013

3. Direct measurement of local lattice distortions in strained layer structures by hrem;Bierwolf;Ultramicroscopy,1993

4. Scanning x-ray microdiffraction with submicrometer white beam for strain/stress and orientation mapping in thin films;Tamura;J. Synchrotron. Radiat.,2003

5. Plastic strain mapping with sub-micron resolution using digital image correlation;Di Gioacchino;Exp. Mech.,2013

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