Back illuminated photo emission electron microscopy (BIPEEM)
Author:
Funder
European Commission
Publisher
Elsevier BV
Subject
Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. Electron beam induced damage of organic solids: implications for analytical electron microscopy;Isaacson;Ultramicroscopy,1979
2. Quantitative analysis of electron beam damage in organic thin films;Leijten;J. Phys. Chem. C,2017
3. Analysis of electron beam damage of exfoliated MoS2 sheets and quantitative HAADF-STEM imaging;Garcia;Ultramicroscopy,2014
4. Multipole WIEN-filter for a high-resolution X-PEEM;Marx;J. Electron Spectrosc. Relat. Phenom.,1997
5. PEEM with high time resolution—imaging of transient processes and novel concepts of chromatic and spherical aberration correction;Schönhense;Surf. Interface Anal.,2006
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