1. W. Luft, Y.S. Tsuo, Hydrogenated Amorphous Silicon Alloy Deposition Processes, Marcel Dekker, New York, 1993
2. G. Bruno, P. Capezutto, A. Madan (Ed.), Plasma Deposition of Amorphous Silicon-Based Materials, Academic Press, San Diego, CA, 1995
3. Effect of ion bombardment in very-high frequency glow discharge on growth and properties of SiHx films
4. G. Ganguly, T. Ikeda, I. Sakata, A. Matsuda, in: M. Hack, E.A. Schiff, S. Wagner, A. Matsuda, R. Schropp (Eds.), Amorphous Silicon Technology, vol. 420, Material Research Society, Pittsburgh, PA, 1996, p. 347
5. P. Roca i Cabarrocas, in: A. Madan, M.J. Thompson, P.C. Taylor, Y. Hamakawa, P.G. LeComber (Eds.), Amorphous Silicon Technology, vol. 149, Material Research Society, Pittsburgh, PA, 1989, p. 33