Stability of a-Si:H deposited at high temperatures and hydrogen dilution in a remote hydrogen plasma reactor-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Stability of a-Si:H deposited at high temperatures and hydrogen dilution in a remote hydrogen plasma reactor

Published:1991-01 Issue: Volume:137-138 Page:235-238
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Johnson N.M.,Santos P.V.,Nebel C.E.,Jackson W.B.,Street R.A.,Stevens K.S.,Walker J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Light-induced metastable defects in hydrogenated amorphous silicon: A systematic study

2. Saturation of the light‐induced defect density in hydrogenated amorphous silicon

3. Hydrogen in amorphous semiconductors

4. Hydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma

5. Characterization of a remote hydrogen plasma reactor with electron spin resonance

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Temperature effects in the hot wire chemical vapor deposition of amorphous hydrogenated silicon carbon alloy;Journal of Applied Physics;2000-05

2. Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma;Journal of Applied Physics;1998-09

3. Characteristic structural features of amorphous hydrated silicon films deposited by direct-currect decomposition of silane in a magnetic field;Semiconductors;1997-07

4. Defects in intrinsic and pseudodoped amorphous hydrated silicon;Semiconductors;1997-03

5. Structure and Electronic Parameters of A-Si:H Deposited by DC-MASD;MRS Proceedings;1997

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3