Experimental evidence for the absence of local thermal equilibrium in chemical sputtering-Reference-Cited by-同舟云学术

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Experimental evidence for the absence of local thermal equilibrium in chemical sputtering

Published:1985-03 Issue: Volume:7-8 Page:809-813
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Dieleman J.,Sanders F.H.M.,Zalm P.C.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference23 articles.

1. Kathodenzerstäubungsprobleme

2. Kathodenzerstäubungsprobleme. (III. Mitteilung) Zur Theorie der Kathodenzerstäubung

3. Sputtering by Particle Bombardment I;Sigmund,1981

4. Thermodynamic approach to the quantitative interpretation of sputtered ion mass spectra

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Silicon etching in Cl2 environment;Applied Surface Science;2006-11

2. Energy distributions of copper ions and atoms sputtered by atomic and molecular ions;Journal of Physics D: Applied Physics;1997-09-07

3. Chemical and physical sputtering of fluorinated silicon;Journal of Applied Physics;1995-02

4. Effect of Photoresist on Plasma Etching;Journal of The Electrochemical Society;1989-08-01

5. Modulated ion beam studies of product formation and ejection in ion‐induced etching of GaAs by Cl2;Journal of Applied Physics;1988-02-15

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