Affiliation:
1. North American Philips Corporation, Philips Laboratories, Briarcliff Manor, New York 10510
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Cited by
11 articles.
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1. 20 nm polysilicon gate patterning and application in 36 nm complementary metal–oxide–semiconductor devices;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003
2. Silicides and ohmic contacts;Materials Chemistry and Physics;1998-02
3. Characterization of Titanium Etching in Cl2 / N 2 Plasmas;Journal of The Electrochemical Society;1997-05-01
4. Microloading effect in reactive ion etching;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-07
5. CHF3-reactive ion etching for waveguides;Sensors and Actuators A: Physical;1993-06