CHF3-reactive ion etching for waveguides-Reference-Cited by-同舟云学术

CHF3-reactive ion etching for waveguides

Published:1993-06 Issue: Volume:37-38 Page:779-783
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Dominguez C.,Muñoz J.,Gonzalez R.,Tudanca M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

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4. Advances in dry etching processes—A review;Fonash;Solid State Technol.,1985

5. A review of plasma processing fundamentals;Sawin;Solid State Technol.,1985

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