Charge neutralisation in the PI9000 series implanters-Reference-Cited by-同舟云学术

Charge neutralisation in the PI9000 series implanters

Published:1991-04 Issue:1-4 Volume:55 Page:413-416
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Wauk M.T.,White N.,Adibi B.,Current M.,Strain J.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference5 articles.

1. Proc. 7th Int. Conf. on Ion Implantation Technology;Wauk,1989

2. these Proceedings 8th Int. Conf. on Ion Implantation Technology;Strain,1991

3. presented at the 8th Int. Conf. on Ion Implantation Technology;Adibi,1990

4. presented at the 8th Int. Conf. on Ion Implantation Technology;Alvis,1990

5. presented at the 8th Int. Conf. on Ion Implantation Technology;Horvath,1990

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3. Effect of the PI9000/9200 charge neutralization system on advanced device characteristics;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-10

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