System and process enhancements of the Applied Materials Precision Implant 9200-Reference-Cited by-同舟云学术

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System and process enhancements of the Applied Materials Precision Implant 9200

Published:1991-04 Issue:1-4 Volume:55 Page:448-452
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Jaffe P.R.,Fairbairn K.P.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference9 articles.

1. Precision implant 9200 — An implantation system for 200 mm wafers

2. presented at the 8th Int. Conf. on Ion Implantation Technology;Edwards,1990

3. Detection and identification of process equipment — generated particles for yield improvement;Hattori,1988

4. Microcontamination;Strain,1989

5. these Proceedings 8th Int. Conf. on Ion Implantation Technology;Leung,1991

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