Potential applications of focused ion beam technology for the semiconductor industry-Reference-Cited by-同舟云学术

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Potential applications of focused ion beam technology for the semiconductor industry

Published:1985-05 Issue: Volume:10-11 Page:515-521
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Reuss R.H.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference40 articles.

1. Focused Ion Beams in Microelectronic Fabrication

2. Ion Implantation and Beam Processing;Rupprecht,1984

3. Semicond. Int.;Murray,1984

4. A 100 kV Maskless Ion-Implantation System with an Au-Si-Be Liquid Metal Ion Source for III-V Compound Semiconductors

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1. Focused Ion Beam Processing for 3D Chiral Photonics Nanostructures;Micromachines;2020-12-23

2. Focused Ion Beams;Handbook of Charged Particle Optics, Second Edition;2008-10-24

3. Applications of Focused Ion Beams;High Resolution Focused Ion Beams: FIB and its Applications;2003

4. Ion-energy distributions in liquid-metal-ion sources;Applied Physics A Solids and Surfaces;1987-11

5. Focused-Ion-Beam Broadening Due to Collisions with Residual Gas Atoms;Japanese Journal of Applied Physics;1987-10-20

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