Repetitive mode pulsed ion implanter with magnetically insulated diode
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference6 articles.
1. Ion beam annealing of semiconductors
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1. High intensity pulsed ion beam sources and their industrial applications;Surface and Coatings Technology;1999-05
2. Damage production and self-annealing during molecular implantation analyzed by RBS and ellipsometry;Radiation Effects and Defects in Solids;1996-01
3. Application of high-power ion beams for technology;Laser and Particle Beams;1993-12
4. High intensity pulsed ion beams in material processing: Equipment and applications;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-02
5. Pulse Ion Beam Doping and Modification of Solids;Physica Status Solidi (a);1989-04-16
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