New microwave ion source for multiply charged ion beam production-Reference-Cited by-同舟云学术

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New microwave ion source for multiply charged ion beam production

Published:1988-01 Issue:6 Volume:38 Page:487-490
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Tokiguchi K,Amemiya K.,Koike H.,Sakudo N.,Seki T.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference12 articles.

1. Proc Int Ion Engineering Congress, ISIAT'83 & IPAT'83;Iwaki,1983

2. A Proposal on Multiply Charged Ion Source

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High energy aluminum ion implantation using a variable energy radio frequency quadrupole implanter;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1998-03

2. Acceleration of high current heavy ions using a variable energy radio‐frequency quadrupole linac and measurement of the input beam emittance;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-03

3. Compact electron cyclotron resonance ion source with a permanent magnet;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1993-07

4. New microwave ion source for plasma‐wall interaction studies;Review of Scientific Instruments;1992-12

5. Ion beam injection system for a variable energy RFQ accelerator;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04

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