Gas incorporation in sputtered and evaporated gold films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference12 articles.
1. Mass Spectrometry of Background Gases in Glow-Discharge Sputtering of Tantalum Thin Films
2. Role of Hydrogen in the Sputtering of Nickel–Chromium Films
3. Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum Films
4. Thin Films Deposited by Bias Sputtering
5. The effect of arrival energy on the properties of gold films
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Sputtertechniken;WFT Werkstoff-Forschung und -Technik;1987
2. Simultaneous measurements of thermopower, thermal conductivity, and electrical resistivity between 1.2 and 350 K;Review of Scientific Instruments;1981-11
3. Glow Discharge Sputter Deposition;Thin Film Processes;1978
4. Electrical properties and stabilization of sputtered films by inert gas precipitation;Thin Solid Films;1976-07
5. Glow discharge sputtering;Progress in Surface Science;1976-01
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