Theory and applications of internal photoemission in the MOS system at low electric fields
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference26 articles.
1. MOS physics and technology;Nicollian,1982
2. Interface barrier energy determination from voltage dependence of photoinjected currents;Powell;J Appl Phys,1970
3. Photoinjection into SiO2: electron scattering in the image force potential well;Berglund;J Appl Phys,1971
4. Photoinjection studies of charge distribution in oxides of MOS structures;Powell;J Appl Phys,1971
5. A simple technique of work function difference determination in MOS structures;Przewlocki;Phys Stat Sol (a),1981
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