Phosphorus diffusion into silicon after vapor phase surface adsorption of phosphine
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference14 articles.
1. Shallow junction doping technologies for ULSI
2. A novel doping technology for ultra-shallow junction fabrication: boron diffusion from boron-adsorbed layer by rapid thermal annealing
3. A novel atomic doping technology for ultra-shallow junction of SOI-MOSFETs
4. Temperature measurement of wafers with varying multilayer structures during rapid thermal annealing
5. A simple two-step phosphorus doping process for shallow junctions by applying a controlled adsorption and a diffusion in an oxidising ambient
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Synergistic role of Co and CoP on highly dispersed cobalt nanoparticles embeded in porous carbon for efficient PH3 decomposition;Separation and Purification Technology;2024-11
2. Recent Advances in Electrochemical Water Splitting and Reduction of CO 2 into Green Fuels on 2D Phosphorene‐Based Catalyst;Energy Technology;2020-12-08
3. Applications of Phosphorene and Black Phosphorus in Energy Conversion and Storage Devices;Advanced Energy Materials;2017-12-01
4. Advances on doping strategies for triple-gate finFETs and lateral gate-all-around nanowire FETs and their impact on device performance;Materials Science in Semiconductor Processing;2017-05
5. Phosphorus atomic layer doping in Ge using RPCVD;Solid-State Electronics;2013-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3