Study of nitrous oxide plasma oxidation of silicon nitride thin films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference22 articles.
1. A back‐side passivation film ona‐Si:H thin film transistor
2. Silicon nitride thin films prepared by the electron cyclotron resonance plasma chemical vapor deposition method
3. Hydrogenated amorphous silicon‐nitrogen alloys,a‐SiNx:Hy: a wide band gap material for optoelectronic devices
4. Visible thin film light emitting diode using a-SiN:H/a-SiC:H heterojunctions
5. Stress‐controlled silicon nitride film with high optical transmittance prepared by an ultrahigh‐vacuum electron cyclotron resonance plasma chemical‐vapor deposition system
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1. Technology/Nuts and Bolts;Biosensing with Silicon;2021
2. Flammability limits, explosion pressures, and applicability of Le Chatelier's rule to binary alkane–nitrous oxide mixtures;Journal of Loss Prevention in the Process Industries;2017-01
3. Impact of Post-deposition Plasma Treatment on Surface Passivation Quality of Silicon Nitride Films;IEEE Journal of Photovoltaics;2016-01
4. Miniaturised silicon biosensors for the detection of triglyceride in blood serum;Anal. Methods;2014
5. Plasma treatment studies of MIS devices;Open Physics;2010-01-01
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