Silicon nitride thin films prepared by the electron cyclotron resonance plasma chemical vapor deposition method
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.344258
Reference24 articles.
1. The Preparation and Properties of Thin Film Silicon-Nitrogen Compounds Produced by a Radio Frequency Glow Discharge Reaction
2. Reactive Plasma Deposited Si‐N Films for MOS‐LSI Passivation
3. Effects of Nitride Deposition Conditions on Characteristics of an MNOS Nonvolatile Memory Transistor
4. Deep Trap States in Si3N4Layer on Si Substrate
5. Amorphous silicon‐silicon nitride thin‐film transistors
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