Low-temperature-deposited AlGaN interlayer for improvement of AlGaN/GaN heterostructure-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Low-temperature-deposited AlGaN interlayer for improvement of AlGaN/GaN heterostructure

Published:2001-02 Issue:1-2 Volume:223 Page:83-91
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Kamiyama Satoshi,Iwaya Motoaki,Hayashi Nobuaki,Takeuchi Tetsuya,Amano Hiroshi,Akasaki Isamu,Watanabe Satoshi,Kaneko Yawara,Yamada Norihide

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference9 articles.

1. Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer

2. Improvement of far-field pattern in nitride laser diodes

3. Reduction of Etch Pit Density in Organometallic Vapor Phase Epitaxy-Grown GaN on Sapphire by Insertion of a Low-Temperature-Deposited Buffer Layer between High-Temperature-Grown GaN

4. Stress and Defect Control in GaN Using Low Temperature Interlayers

5. Low-Intensity Ultraviolet Photodetectors Based on AlGaN

Cited by 91 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Wafer-scale vertical injection III-nitride deep-ultraviolet light emitters;2024-06-06

2. Solve the Asymmetric Doping for Wide-Gap Semiconductors by Host-Functionalization: Quantum Engineering Strategy;2024

3. Improvement of Optoelectronic Characteristics of Deep-ultraviolet Laser Diode with an Optimal Thickness of Electron Blocking Layer and Waveguide Layer;2022 19th China International Forum on Solid State Lighting & 2022 8th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS);2023-02-07

4. Two-Step GaN Layer Growth for High-Voltage Lateral AlGaN/GaN HEMT;Crystals;2023-01-03

5. Thickness-dependent physical and nanomechanical properties of AlxGa1−xN thin films;Materials Science in Semiconductor Processing;2022-11

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3