A study of growth and morphological features of TiOxNy thin films prepared by MOCVD
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference15 articles.
1. Study of TiOxNy thin film selective surfaces produced by ion assisted deposition
2. Correlation Between the Electrical Properties and the Morphology of Low-Pressure MOCVD Titanium Oxynitride Thin Films Grown at Various Temperatures
3. Wear resistant coating of cemented carbides and high speed steels by chemical vapour deposition
4. Low temperature metal-organic chemical vapor deposition of advanced barrier layers for the microelectronics industry
5. MOCVD of TiN and/or Ti from new precursors
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1. Analysis of nitrogen species in titanium oxynitride ALD films;Applied Surface Science;2016-09
2. Multilevel metal/Pb(Zr0.52Ti0.48)O3/TiOxNy/Si for next generation FeRAM technology node;Solid-State Electronics;2015-09
3. Effect of electrical stress on Au/Pb (Zr0.52Ti0.48) O3/TiOxNy/Si gate stack for reliability analysis of ferroelectric field effect transistors;Applied Physics Letters;2014-10-13
4. Design, Fabrication, and Modification of Cost-Effective Nanostructured TiO2 for Solar Energy Applications;Green Energy and Technology;2014
5. Structural and Mechanical Properties of TiON Nanocomposite Films Deposited on Silicon by Pulsed Bias Arc Ion Plating;PRICM;2013-09-06
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