Analysis of nitrogen species in titanium oxynitride ALD films-Reference-Cited by-同舟云学术

Analysis of nitrogen species in titanium oxynitride ALD films

Published:2016-09 Issue: Volume:381 Page:42-47
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Sowińska Małgorzata,Brizzi Simone,Das Chittaranjan,Kärkkänen Irina,Schneidewind Jessica,Naumann Franziska,Gargouri Hassan,Henkel Karsten,Schmeißer Dieter

Funder

German Federal Ministry of Education and Research

German Research Foundation

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference37 articles.

1. Characterization of titanium oxynitride films deposited by low pressure chemical vapor deposition using amide Ti precursor

2. Graded selective coatings based on chromium and titanium oxynitride

3. Characterizations of high resistivity TiNxOy thin films for applications in thin film resistors

4. Bacterial adhesion to titanium-oxy-nitride (TiNOX) coatings with different resistivities: a novel approach for the development of biomaterials

5. TiOxNy coatings grown by atmospheric pressure metal organic chemical vapor deposition

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