Effects of carbon additions on crystallinity and resistivity in Si–C–H thin films deposited by CVDs
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Reference24 articles.
1. Electrical properties and hopping transport in amorphous silicon carbide films;Nair;J. Non-Cryst. Solids,1977
2. Characterization of ultra-hard silicon carbide coatings deposited by RF magnetron sputtering;Costa;Thin Solid Films,2000
3. Low temperature direct growth of nanocrystalline silicon carbide films;Kerdiles;Mater. Sci. Engng B,2000
4. Fast SiC epitaxial growth in a chimney CVD reactor and HTCVD crystal growth;Ellison;Mater. Sci. Forum,2000
5. Fabrication of low-stress plasma enhanced chemical vapor deposition silicon carbide films;Lin;Jpn. J. Appl. Phys., Part 1,2000
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices;Materials;2024-02-29
2. Studying Electron Transport Coefficients in C2H4-SiH4 Mixtures Using Bolsig+ Program;Advances in Engineering Research and Application;2020-11-24
3. Plasma-chemical synthesis of transparent dielectric Si–C–O–H films from trimethylphenoxysilane;High Energy Chemistry;2016-05
4. Determination of the electron collision cross sections for the C2H4 molecule by using the electron swarm method;Journal of the Korean Physical Society;2014-05
5. Si-rich a-Si1−xCx thin films by d.c. magnetron co-sputtering of silicon and silicon carbide: Structural and optical properties;Applied Surface Science;2013-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3