Microscopic modeling and optimal operation of plasma enhanced atomic layer deposition

Author:

Ding Yangyao,Zhang Yichi,Orkoulas Gerassimos,Christofides Panagiotis D.

Funder

National Science Foundation

Publisher

Elsevier BV

Subject

General Chemical Engineering,General Chemistry

Reference63 articles.

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2. Kinetic Monte Carlo simulation of chemical vapor deposition;Battaile;Annu. Rev. Mater. Res.,2002

3. Comparative performance of several recent supervised learning algorithms;Bazzi;Int. J. Comput Inform. Technol.,2018

4. Bayesian Regularization of Neural Networks, Artificial Neural Networks: Methods and Applications;Burden,2008

5. Plasma-enhanced atomic-layer deposition of a HfO2 gate dielectric;Choi;J. Kor. Phys. Soc.,2004

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