Computational fluid dynamics modeling of a wafer etch temperature control system-Reference-Cited by-同舟云学术

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Computational fluid dynamics modeling of a wafer etch temperature control system

Published:2023-09 Issue: Volume:8 Page:100102
ISSN:2772-5081
Container-title:Digital Chemical Engineering
language:en
Short-container-title:Digital Chemical Engineering

Author:

Oyama Henrique,Nieman Kip,Tran Anh,Keville Bernard,Wu Yewei,Durand Helen

Funder

Lam Research

National Science Foundation

Wayne State University

Publisher

Elsevier BV

Subject

Engineering (miscellaneous),Chemical Engineering (miscellaneous)

Reference26 articles.

1. Heat transfer applications using 3M™ Fluorinert™ electronic liquids;3M,2021

2. 3M™ Fluorinert electronic liquids;Acota,2021

3. Realizable k-ϵ model;ANSYS,2023

4. Shear-stress transport (SST) k-ω model;ANSYS,2023

5. Chapter 7: The IMC-based PID procedure;Bequette,1999

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Editorial - special issue on autonomy, safety, and security for cyber-physical systems in the process industries;Digital Chemical Engineering;2023-09

2. Innovative Approaches to Thermal Management in Next-Generation Electronics;E3S Web of Conferences;2023

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