Large area deposition: Sputtering- and PCVD-systems and techniques for LCD
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Deposition of Tantalum Films with an Open-Ended Vacuum System
2. Effects of low‐frequency modulation on rf discharge chemical vapor deposition
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1. Effects of Molybdenum Microstructures on Sputtered Films;MATERIALS TRANSACTIONS;2015
2. Sputtering Targets and Sputtered Films for the Microelectronic Industry;Sputtering Materials for VLSI and Thin Film Devices;2014
3. a-Si:H TFT enhancement by plasma processing of the insulating/semiconductor interface;Materials Science and Engineering: B;2004-06
4. Effects of surface damaging and overcoating on the formation of hillocks and whiskers on pure Al films deposited on to a glass substrate;Philosophical Magazine A;2001-02
5. Uniformity improvement in dc magnetron sputtering deposition on a large area substrate;Vacuum;1998-12
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