Sputtering Targets and Sputtered Films for the Microelectronic Industry-Reference-Cited by-同舟云学术

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Sputtering Targets and Sputtered Films for the Microelectronic Industry

Published:2014 Issue: Volume: Page:1-92
ISSN:
Container-title:Sputtering Materials for VLSI and Thin Film Devices
language:
Short-container-title:

Author:

Sarkar Jaydeep

Publisher

Elsevier

Reference165 articles.

1. The materials science of semiconductors;Rockett,2008

2. The materials science of thin films;Ohring,1992

3. Silicon VLSI technology: fundamentals, practices and modeling;Plummer,2000

4. Silicon processing for the VLSI Era;Wolf,2000

5. Introduction to semiconductor devices;Hauser,2008

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of nitrogen flow ratio on microstructure, mechanical and tribological properties of TiWSiNx thin film deposited by magnetron co-sputtering;Applied Surface Science;2018-10

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